eBeam Community Speaks Out on Future Directions for Photomask Manufacturing
As has been the case for many years and for the near future down to the 7-nm logic node, electron-beam (eBeam) mask writing is pushing the limits of acceptable write times and quality. The eBeam community has responded to these challenges through innovation, engineering and collaboration. In 2009, the eBeam Initiative was launched to provide a stronger voice and educational platform for eBeam technology within the photomask and semiconductor design and manufacturing ecosystem. For the fourth consecutive year, as the photomask community heads to the annual SPIE/BACUS Photomask Symposium in Monterey, the eBeam Initiative has conducted a survey on photomask-related Read More